LAM is a semiconductor processing and fabrication equipment designer and manufacturer who has announced a new dry photoresist technology in collaboration with IMEC and ASML. This new dry technology differs from the wet photoresist currently used in all commercial semiconductor foundries such as TSMC, Intel, Samsung, Micron, Global Foundries and SK Hynix.
0 subscriptions will be displayed on your profile (edit)
Skip for now
For your security, we need to re-authenticate you.
Click the link we sent to , or click here to sign in.